NavX match platform’s accelerated response minimises reflected power for precise control of plasma characteristics in complex semiconductor processes.
Advanced Energy Industries has launched its NavX impedance matching network. The solution offers enhanced algorithms and direct generator communication that can provide improved levels of precision and repeatability in plasma control. This is pivotal in the ‘Angstrom-Era’ fabrication.
Unprecedented levels of plasma control (particularly during rapid pulsing), frequent transitions, and longer recipes are critical when keeping up with semiconductor etch process standards. These factors are also needed to fabricate smaller, faster, and more efficient chips with more complex 3D structures.
Key features of the NavX:
- Designed with direct match-generator communication.
- Frequency span of +/- 10% allowing for faster tuning and a wider impedance range.
- Boasts ultra-fast tuning to leverage AE hardware and proprietary algorithms.
- Enables RF-synchronised impedance matching during multilevel pulse states to ensure precise control of plasma characteristics.
- Intermodulation distortion (IMD) immunity further secures tuning accuracy in multi-frequency applications.
- When paired with the eVerest generator, NavX completes AE’s latest RF delivery system.
- Compatible with Advanced Energy’s IoT platform, PowerInsight, to provide high-resolution, actionable data.
“Building on over 20 years of experience in developing advanced RF delivery systems for plasma processes, the NavX matching network redefines tuning speed, sophistication and RF synchronisation for exacting plasma control across the most complex pulsing profiles,” said Juergen Braun, Senior Vice President of Plasma Power Products at Advanced Energy. “The platform’s groundbreaking selectable tuning algorithm, which enables impedance matching to multiple RF pulse states, instantly reduces reflected power in processes with shorter RF-on times.”